SENTECH and YF Precision Join Forces to Advance Plasma Etching Technology for 2D Materials & Compound Semiconductors
Hsinchu, Taiwan — September 9, 2025 — Germany’s SENTECH Instruments GmbH, a Berlin-based, industry-leading manufacturer of low-damage etching, low-temperature deposition and precision thin film quality control systems, has formed a strategic partnership with Taiwan’s New Yuan Feng Precision Co., Ltd. to co-develop advanced semiconductor etching solutions, addressing the rising demand for atomic-level precision in chip manufacturing.
The partnership will focus on integrating atomic layer etching (ALE) into production for 2D materials, nanosheet transistors, photonics, and compound semiconductors such as GaN HEMTs and RF devices. By minimising material damage and enhancing surface uniformity and depth accuracy, the collaboration aims to boost yield and performance in next-generation chips.
“We are very pleased to be in partnership with SENTECH. Our focus is on delivering to market SENTECH’s expert knowledge and system capabilities in real-time monitoring for etch control in ALE processes. ALE allows for highly-precise removal of sensitive material layers, which is critical in applications for 2D materials like graphene and MoS₂, and GaN, vital for today’s leading-edge, advanced semiconductor devices”.
Mr. Bob Lin, General Manager of New YF Precision Corp.
The two firms plan to target process challenges in 2D material integration and GaN HEMT fabrication, including substrate conditioning, edge trimming, and controlled AlGaN etching for enhanced 2DEG stability. Industry analysts predict a broader trend toward atomic-scale process control in advanced chipmaking, as manufacturers seek to improve power efficiency and device performance. The partnership is intended to support Taiwan’s developing semiconductor supply chain by accelerating the commercialisation of emerging materials.
“This partnership combines SENTECH’s expertise in ALE with New YF Precision’s local strengths to deliver advanced solutions for next-generation semiconductors. Together, we aim to enable atomic-scale precision that drives higher performance and supports the growth of Taiwan’s semiconductor ecosystem.”
Friedrich Witek, CEO of SENTECH Instruments GmbH.
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About SENTECH Instruments GmbH
SENTECH has over thirty years of experience developing and manufacturing plasma process technology systems and thin film metrology tools for research and development and industrial production worldwide. Our robust systems focus on the etching, deposition, and characterisation of thin films in semiconductor technology, microsystems technology, photovoltaics, nanotechnology, and materials research.
The SENTECH flexible and reliable plasma etch and deposition systems, including atomic layer etching and deposition equipment, support state-of-the-art processes and applications. Our tools and systems are used worldwide for applications in the fields of nanotechnology, micro-optics, sensor technology, photonics, and optoelectronics. Low-damage etching and coating with the proprietary SENTECH Planar triple spiral antenna (PTSA) inductively coupled plasma (ICP) source enables our customers to manufacture compound semiconductors and semiconductor devices with outstanding sensitivity, scalability, and non-destructive properties.
SENTECH offer a wide range of spectroscopic ellipsometers, laser ellipsometers, and reflectometers for measuring the thickness and optical constants of very thin layers or layer stacks. SENTECH has achieved particular success in the field of industrial quality control in photovoltaics, 5G devices, and sensor technology.
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